教員情報
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ナカムラ ケイジ
NAKAMURA Keiji
中村 圭二
所属
工学部 電気電子システム工学科
大学院工学研究科 電気電子工学専攻
職名
教授
学会発表
2013/01
Curling Probe Monitoring of Plasma CVD and Wall Cleaning Processes (5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) Tup-A07OA)
2013/01
Curling Probe Monitoring of Plasma CVD and Wall Cleaning Processes' Tup-A07OA (5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013))
2013/01
Effects of configuration on resonance characteristics of plane-type microwave resonator probe (5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) P1024.)
2013/01
Effects of configuration on resonance characteristics of plane-type microwave resonator probe (5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) P1024.)
2013/01
In-itu photo luminescence observation of GaN thin film exposed in inductively-coupled plasmas (5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) P1030A)
2013/01
In-itu photo luminescence observation of GaN thin film exposed in inductively-coupled plasmas (5th International Symposium on Advanced Plasma Science and its Application for Nitrides and Nanomaterials (ISPlasma2013) P1030A)
2012/11
In-situ Photoluminescence Measurements of GaN Films Exposed to Inductively-Coupled Plasmas (34th Int. Symp. Dry Process (DPS2012)P-64)
2012/11
In-situ Photoluminescence Measurements of GaN Films Exposed to Inductively-Coupled Plasmas (34th Int. Symp. Dry Process (DPS2012) P-64)
2012/11
Monitoring of electron density and wall deposit by curling probe during plasma process (34th Int. Symp. Dry Process (DPS2012) E-4)
2012/11
Monitoring of electron density and wall deposit by curling probe during plasma process (34th Int. Symp. Dry Process (DPS2012) E-4)
2012/10
In Situ Monitoring of Electron Density and Dielectric Layer on the Wall with Curling Probe (AVS 59th International Symposium and Exhibition PS1-WeA3)
2012/10
In Situ Monitoring of Electron Density and Dielectric Layer on the Wall with Curling Probe (AVS 59th International Symposium and Exhibition PS1-WeA3)
2012/10
In-situ Monitoring of Surface Modification of GaN Films Exposed to Inductively-Coupled Plasmas (65th Annual Gaseous Electronics Conference (GEC)NW1.00072)
2012/10
In-situ Monitoring of Surface Modification of GaN Films Exposed to Inductively-Coupled Plasmas (65th Annual Gaseous Electronics Conference (GEC) NW1.00072)
2012/10
Novel diagnostic tool, curling probe, for monitoring electron density during plasma processing (65th Annual Gaseous Electronics Conference (GEC)DT1.00004)
2012/10
Novel diagnostic tool, curling probe, for monitoring electron density during plasma processing (65th Annual Gaseous Electronics Conference (GEC) DT1.00004)
2012/07
In-situ photoluminescence monitoring of GaN in plasma exposure (4th Int. Conf. Microelectronics & Plasma Technology (ICMAP2012) S021 2012-372, p. 505)
2012/07
In-situ photoluminescence monitoring of GaN in plasma exposure (4th Int. Conf. Microelectronics & Plasma Technology (ICMAP2012)S021 2012-372, p. 505)
2012/03
Miniaturization of Plane-Type Microwave Resonator Probe with Multi-Resonant Frequencies (5th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2012) P-01)
2012/03
Miniaturization of Plane-Type Microwave Resonator Probe with Multi-Resonant Frequencies (5th International Conference on Plasma-Nano Technology & Science (IC-PLANTS2012) P-01)
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