Faculty - NAKANO Yoshitaka |

（Last updated : 2024-05-16 21:49:03）

NAKANO Yoshitaka

Department / Course College of Engineering Department of Electrical and Electronic Engineering

Graduate School of Engineering Department of Electrical and Electronic Engineering

Frontier Research Institute

Job Professor

Academic background
1985/04/01～1989/03/31	Waseda University Graduated
1989/04/01～1991/03/31	Master Waseda University Finished
2004/03/26 Degree Acquisition	Electric and electronic materials

Business career
2018/04 ～	Chubu University College of Engineering
2014/04 ～ 2018/03	Chubu University
2008/01 ～ 2014/03	Chubu University Institute of Science and Technology Research

Belonging society
	THE JAPAN SOCIETY OF APPLIED PHYSICS
	Electrochemical Society
	American Vacuum Society

Present specialized field
半導体工学, パワー半導体, 物性デバイス

Book and thesis
Books	Trends in Applied Spectroscopy Vol.9 Steady-State Photo-Capacitance Spectroscopy Investigation of Carbon-Related Deep-Level Defects in AlGaN/GaN Hetero-Structures Grown by MOCVD (Co-authored) 2013
Books	Solar Cells - New Aspects and Solutions Transparent Conducting Polymer/Nitride Semiconductor Heterojunction Solar Cells (Co-authored) 2011
Books	Recent Research Developments in Materials Science Vol. 7 Visible-Light Sensitivity in N-Doped ZnO Films (Co-authored) 2007
Books	Recent Research Developments in Applied Physics Vol. 8 Ion-Implantation Doping and Gate Insulators for GaN Power Devices 8 (Co-authored) 2006
Papers	Plasma-assisted annealing of Pt-doped rutile TiO2 nanoparticles for enhanced decomposition and bacterial inactivation under general lighting J. Vac. Sci. Technol. B 42, 012203 (2024) 42,pp.012203 (Co-authored) 2024
Display All（158）

Academic conference presentation
2023/11	Bacterial Inactivation of Pt-doped Rutile TiO2 Nanoparticles Annealed with Low-Temperature O2 Plasma (The 44th International Symposium on Dry Process (DPS2023))
2023/11	Photocatalytic Activity Enhancement of Titanium Dioxide Nanoparticles via High-Pressure Annealing with Polyethylene Glycol (The 44th International Symposium on Dry Process (DPS2023))
2023/11	Photocatalytic Activity of g-C3N4 Nanosheets Grown by High-Pressure Annealing (The 44th International Symposium on Dry Process (DPS2023))
2023/11	Photocatalytic Characteristics of TiO2/Au/TiO2/Au Stacked Nanostructure Induced by Ultraviolet and Visible light Irradiation (The 44th International Symposium on Dry Process (DPS2023))
2023/11	Real-time observation of oxidation process on GaN surfaces by x-ray photoelectron spectroscopy (The 14th International Conference on Nitride Semiconductors (ICNS-14))
Display All（122）

Research topic, funded research, and department laboratory expense
2019/04 ～ 2022/03	Global Investigation of Electrical Damage Introduced into p-GaN Films by Plasma Ion Bombardments Grant-in-Aid for Scientific Research (C)
2014/04 ～ 2018/03	Elucidation of UV irradiation effect in plasma etching process of wide gap semiconductors Grant-in-Aid for Scientific Research (C)
2014/04 ～ 2017/03	Investigation on hydrogen interaction with nitride-based semiconductor metal/semiconductor interfaces Grant-in-Aid for Scientific Research (C)
2011/04 ～ 2015/03	Hydrogen sensors using nitride-based semiconsuctor devices Grant-in-Aid for Scientific Research (C)
2010/04/01 ～ 2013/03/31	Band-gap states and quality analyses of AlGaN/GaN hetero-structures 基盤研究(C)
Display All（6）

Acquisition patent
	Group III nitride semiconductor device （US Patent 7211839）
	III-V HEMT DEVICES （US Patent 7777252）
	Metal oxide semiconductor transistor having a nitrogen cluster （US Patent 6972459）